Invention Grant
US07018771B2 Material transfer method and manufacturing method for substrate for plasma display
失效
用于等离子体显示的衬底的材料转移方法和制造方法
- Patent Title: Material transfer method and manufacturing method for substrate for plasma display
- Patent Title (中): 用于等离子体显示的衬底的材料转移方法和制造方法
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Application No.: US11110784Application Date: 2005-04-21
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Publication No.: US07018771B2Publication Date: 2006-03-28
- Inventor: Osamu Toyoda , Kazunori Inoue , Akira Tokai
- Applicant: Osamu Toyoda , Kazunori Inoue , Akira Tokai
- Applicant Address: JP Kawasaki JP Tokyo
- Assignee: Fujitsu Limited,Advanced PDP Development Center Corporation
- Current Assignee: Fujitsu Limited,Advanced PDP Development Center Corporation
- Current Assignee Address: JP Kawasaki JP Tokyo
- Agency: Staas & Halsey LLP
- Priority: JP2004-221032 20040729
- Main IPC: B41M1/10
- IPC: B41M1/10 ; B32B31/20 ; C03B21/00 ; G03F7/40 ; B44C1/165
Abstract:
The present invention provides a highly reliable technology for manufacturing a substrate with protrusions. After filling an UV-curable transfer material into the grooves of an intaglio plate for transfer, the UV-curable transfer material is cured by irradiating UV rays under the conditions where it is exposed to an atmosphere that contains at least one of oxygen and ozone while a curing-inhibited portion is formed in an area of the UV-curable transfer material exposed to this atmosphere, and the UV-curable transfer material is transferred to the substrate to form the protrusions, while the curing-inhibited portion is made to adhere to the substrate.
Public/Granted literature
- US20060024608A1 MATERIAL TRANSFER METHOD AND MANUFACTURING METHOD FOR SUBSTRATE FOR PLASMA DISPLAY Public/Granted day:2006-02-02
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