发明授权
- 专利标题： Method and structure to improve properties of tunable antireflective coatings
- 专利标题（中）： 改善可调抗反射涂层性能的方法和结构
-
申请号： US10710409申请日： 2004-07-08
-
公开(公告)号： US07022622B2公开(公告)日： 2006-04-04
- 发明人: Kangguo Cheng , Ramachandra Divakaruni
- 申请人： Kangguo Cheng , Ramachandra Divakaruni
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理商 Lisa U. Jaklitsch
- 主分类号： H01L21/31
- IPC分类号： H01L21/31 ; H01L21/469
摘要：
A method for improving the properties of tunable etch resistant anti-reflective coatings (TERA) is disclosed. The method includes annealing the deposited layer of TERA in an environment containing at least one of hydrogen and deuterium. The annealed layer has an increased concentration of hydrogen and/or deuterium as compared to the deposited film, and may also have an additional concentration of hydrogen or deuterium at the interface between the substrate and the layer of TERA.
公开/授权文献
信息查询
IPC分类:
