Invention Grant
- Patent Title: Coating apparatus and method
- Patent Title (中): 涂布装置及方法
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Application No.: US10763248Application Date: 2004-01-26
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Publication No.: US07025830B2Publication Date: 2006-04-11
- Inventor: Shin Kanke
- Applicant: Shin Kanke
- Applicant Address: JP Kanagawa
- Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Young & Thompson
- Priority: JP2003-016468 20030124
- Main IPC: B05C11/10
- IPC: B05C11/10

Abstract:
A coating apparatus and method are disclosed in which even if poor coating occurs in a lower-layer, no poor coating occurs in an upper-layer formed on the lower-layer. A pre-wet liquid coating device is disposed between a first coating device at the upstream side of a support web conveying direction, and a second coating device disposed at the downstream side. When an uncoated portion is formed by the first coating device, a pre-wet liquid is coated by a pre-wet liquid coating device, and the coating liquid can be reliably coated by the second coating device. When the pre-wet liquid coating device is removed from the support web, first, the pre-wet liquid coating device is brought into liquid-running out state, and thereafter, removed from the support web. Accordingly, the pool of pre-wet liquid is eliminated and occurrence of a thickly coated portion on the support web can be prevented.
Public/Granted literature
- US20040149206A1 Coating apparatus and method Public/Granted day:2004-08-05
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