发明授权
- 专利标题： Compounds exhibiting X-type sPLA2 inhibiting effect
- 专利标题（中）： 表现出X型sPLA2抑制作用的化合物
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申请号： US10311282申请日： 2001-06-27
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公开(公告)号： US07026318B2公开(公告)日： 2006-04-11
- 发明人: Tomoyuki Ogawa , Kaoru Seno , Kohji Hanasaki , Minoru Ikeda , Takashi Ono
- 申请人： Tomoyuki Ogawa , Kaoru Seno , Kohji Hanasaki , Minoru Ikeda , Takashi Ono
- 申请人地址： JP Osaka
- 专利权人： Shionogi & Co., Ltd.
- 当前专利权人： Shionogi & Co., Ltd.
- 当前专利权人地址： JP Osaka
- 代理机构： Wenderoth, Lind & Ponack, L.L.P.
- 优先权： JP2000-195430 20000629
- 国际申请： PCT/JP01/05479 WO 20010627
- 国际公布： WO02/00621 WO 20020103
- 主分类号： A01N43/58
- IPC分类号： A01N43/58 ; A01N43/60 ; A61K31/495 ; A61K31/50 ; C07D241/36
摘要：
A compound represented by the general formula: wherein R20 is —CH2COOH and the like; R21 is —COCONH2 and the like; R22 is C4–C6 alkyl; and the like; R23 is —CH2—R18 wherein R18 is aryl and the like; R24 is hydrogen or C1–C6 alkyl and the like; an optical active compound, a prodrug thereof, or a pharmaceutically acceptable salt, or a solvate having type X sPLA2 inhibitory effect was found.
公开/授权文献
- US20030181454A1 Compounds exhibiting x-type spla2 inibiting effect 公开/授权日：2003-09-25