发明授权
- 专利标题: Method and apparatus for metallization of large area substrates
- 专利标题(中): 用于大面积基板金属化的方法和装置
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申请号: US10247403申请日: 2002-09-19
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公开(公告)号: US07029529B2公开(公告)日: 2006-04-18
- 发明人: Kam S. Law , Robert Z. Bachrach , John M. White , Quanyuan Shang
- 申请人: Kam S. Law , Robert Z. Bachrach , John M. White , Quanyuan Shang
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patterson & Sheridan, LLP
- 主分类号: B05C1/02
- IPC分类号: B05C1/02 ; B05C13/02
摘要:
A system and method for processing large area substrates. In one embodiment, a system for processing large area substrates includes prep station, a stamping station and a stamp that is automatically moved between the stamping station and the prep station. The stamping station is adapted to retain a large area substrate thereon. The stamp has a patterned bottom surface that is adapted for microcontact printing. The prep station is for applying a precursor to the patterned bottom surface of the stamp. In one embodiment, a method for processing large area substrates includes the steps of disposing a large area substrate on a platen, inking a stamp adapted for microcontact printing, and automatically contacting a bottom of the stamp to the large area substrate supported on a platen.
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