Invention Grant
- Patent Title: Microwave plasma source
- Patent Title (中): 微波等离子体源
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Application No.: US10502927Application Date: 2002-08-23
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Publication No.: US07030979B2Publication Date: 2006-04-18
- Inventor: Michael R. Hammer
- Applicant: Michael R. Hammer
- Applicant Address: AU Mulgrave
- Assignee: Varian Austrailia PTY LTD
- Current Assignee: Varian Austrailia PTY LTD
- Current Assignee Address: AU Mulgrave
- Agent Bella Fishman
- Priority: AUPS0442 20020211
- International Application: PCT/AU02/01142 WO 20020823
- International Announcement: WO03/069964 WO 20030821
- Main IPC: G01N21/73
- IPC: G01N21/73

Abstract:
A plasma source for a spectrometer includes a plasma torch (10) located within a waveguide or resonant cavity (40) for both the electric and the magnetic field components of a microwave electromagnetic field to excite a plasma (54). This produces a plasma (54) having a generally elliptical cross section into which sample is relatively easily injected but which still provides good thermal coupling between the plasma and the sample. The invention gives significantly improved limits of detection compared to prior art microwave induced plasma systems. The torch is preferably axially aligned with the direction of the magnetic field component and may be located within a resonant iris (32) within the waveguide or cavity (40).
Public/Granted literature
- US20050078309A1 Microwave plasma source Public/Granted day:2005-04-14
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