发明授权
- 专利标题: Method of microlens array and projection type of liquid crystal display apparatus
- 专利标题(中): 微透镜阵列和投影型液晶显示装置的方法
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申请号: US10672343申请日: 2003-09-25
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公开(公告)号: US07031064B2公开(公告)日: 2006-04-18
- 发明人: Kazuya Kitamura , Yukio Kurata , Yoshihiro Sekimoto , Kuniaki Okada , Noboru Fujita , Yukiko Nagasaka , Hiroshi Nakanishi
- 申请人: Kazuya Kitamura , Yukio Kurata , Yoshihiro Sekimoto , Kuniaki Okada , Noboru Fujita , Yukiko Nagasaka , Hiroshi Nakanishi
- 申请人地址: JP Osaka
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: JP Osaka
- 代理机构: Edwards Angell Palmer & Dodge LLP
- 代理商 David G. Conlin; Peter J. Manus
- 优先权: JPP2002-279946 20020925
- 主分类号: G02B27/10
- IPC分类号: G02B27/10
摘要:
An object of the invention is to provide a method of manufacturing a microlens array and a projection-type liquid crystal display apparatus which can increase the efficiency of use of light, facilitate a method of manufacturing a microlens array and reduce the cost of equipment. By an operation of only irradiating a first lens with parallel light which has an intensity distribution corresponding to the shape of a second lens and irradiating an ultraviolet curing resin layer with transmission light, the first and second lenses are placed with a high alignment accuracy in a mutual positional relation thereof. By irradiating the first lens with the parallel light, it becomes possible to uniformly expose a broad area, and it becomes possible to expose by the wafer.
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