发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
-
申请号： US10754634申请日： 2004-01-12
-
公开(公告)号： US07034924B2公开(公告)日： 2006-04-25
- 发明人: Harmen Klass Van Der Schoot , Hernes Jacobs , Martinus Arnoldus Henricus Terken
- 申请人： Harmen Klass Van Der Schoot , Hernes Jacobs , Martinus Arnoldus Henricus Terken
- 申请人地址： NL Veldhoven
- 专利权人： ASLM Netherlands B.V.
- 当前专利权人： ASLM Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/60
- IPC分类号： G03B27/60
摘要：
A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least one of the compartments is shielded from the high vacuum chamber and is provided with separate gas evacuating structures.
公开/授权文献
- US20050151945A1 Lithographic apparatus and device manufacturing method 公开/授权日：2005-07-14