- 专利标题： Substrate for electrooptic device and method of manufacturing the same, electrooptic device, and electronic equipment
-
申请号： US11087883申请日： 2005-03-23
-
公开(公告)号： US07034976B2公开(公告)日： 2006-04-25
- 发明人: Yoshihiro Otagiri , Keiji Takizawa , Tomoyuki Nakano , Hideki Kaneko , Chihiro Tanaka
- 申请人： Yoshihiro Otagiri , Keiji Takizawa , Tomoyuki Nakano , Hideki Kaneko , Chihiro Tanaka
- 申请人地址： JP
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP
- 代理机构： Harness, Dickey & Pierce, P.L.C.
- 优先权： JP2001-383023 20011217; JP2002-303217 20021017
- 主分类号： G02B26/00
- IPC分类号： G02B26/00 ; G02B1/03 ; H01L21/00
摘要：
A substrate for an electrooptic device comprising a light-transmissive base member, a reflection layer formed on the base member so as to include each reflection portion and a corresponding transmission portion having a transmission factor higher than that of the reflection portion, a light transmission layer formed over the base member so as to coincide with the reflection layer and to include each hollow at a position that coincides with the transmission portion in plane, and an orientation film formed over the base member so as to coincide with the light transmission layer and to define a concavity while entering the corresponding hollow. The thickness “b” of a liquid crystal layer corresponding to the concavity is greater than the thickness “a” of the liquid crystal layer at the other positions thereof.
公开/授权文献
信息查询
