- 专利标题: LSI mask manufacturing system, LSI mask manufacturing method and LSI mask manufacturing program
-
申请号: US10397543申请日: 2003-03-26
-
公开(公告)号: US07047094B2公开(公告)日: 2006-05-16
- 发明人: Kiyomi Koyama
- 申请人: Kiyomi Koyama
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Kilpatrick Stockton LLP
- 优先权: JPP2002-090029 20020327
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
A computer implemented method for LSI mask manufacturing stores performance information of a lithography unit, connected to a network, in a lithography unit database. The method receives a lithography data and a lithography reservation condition from a user terminal connected to the network. The method stores the lithography data in a lithography data database. The method searches for a lithography unit matching to the lithography reservation condition, generating a list of lithography units, and sending the list to the user terminal. In addition, the method receives information of a lithography unit specified by the user terminal and sending a lithography request to the lithography unit specified by the user terminal.
公开/授权文献
信息查询