Invention Grant
- Patent Title: Photosensitive composition
- Patent Title (中): 感光组合物
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Application No.: US10446145Application Date: 2003-05-28
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Publication No.: US07049043B2Publication Date: 2006-05-23
- Inventor: Ippei Nakamura , Ikuo Kawauchi , Takeshi Serikawa , Mitsumasa Tsuchiya
- Applicant: Ippei Nakamura , Ikuo Kawauchi , Takeshi Serikawa , Mitsumasa Tsuchiya
- Applicant Address: JP Kanagawa
- Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Sughrue Mion, PLLC
- Priority: JP2002-154279 20020528
- Main IPC: G03F7/021
- IPC: G03F7/021 ; G03F7/30
Abstract:
The invention provides a photosensitive composition including (A) a vinyl polymer containing a copolymerization component having a carboxyl group, having a content of the carboxyl group in a molecule of 2.0 meq/g or higher and having a solubility parameter less than 21.3 MPa1/2, (B) a polymer compound including a phenolic hydroxyl group, and (C) an IR absorber.
Public/Granted literature
- US20040018444A1 Photosensitive composition Public/Granted day:2004-01-29
Information query
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