发明授权
- 专利标题： Photoresist stripping composition and cleaning composition
- 专利标题（中）： 光阻剥离组合物和清洗组合物
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申请号： US10385721申请日： 2003-03-12
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公开(公告)号： US07049275B2公开(公告)日： 2006-05-23
- 发明人: Kazuto Ikemoto , Yoshiaki Yamamoto , Hiroshi Yoshida , Taketo Maruyama
- 申请人： Kazuto Ikemoto , Yoshiaki Yamamoto , Hiroshi Yoshida , Taketo Maruyama
- 申请人地址： JP Tokyo
- 专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址： JP Tokyo
- 代理机构： Antonelli, Terry, Stout and Kraus, LLP.
- 优先权： JP2002-66529 20020312; JP2002-183711 20020624
- 主分类号： C11D7/50
- IPC分类号： C11D7/50
摘要：
The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1: wherein R1 to R3 are as defined in the specification. Of the oxymethylamine compound of the formula 1, the compound represented by the following formula 7: wherein R2 to R5 and n are as defined in the specification, is a novel compound.
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