发明授权
- 专利标题: Projection optical system, exposure apparatus, and device manufacturing method
- 专利标题(中): 投影光学系统,曝光装置和装置制造方法
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申请号: US11267858申请日: 2005-11-03
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公开(公告)号: US07053986B2公开(公告)日: 2006-05-30
- 发明人: Takashi Kato , Chiaki Terasawa
- 申请人: Takashi Kato , Chiaki Terasawa
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Morgan & Finnegan, LLP
- 优先权: JP2003-146442 20030523; JP2003-187469 20030630; JP2003-189594 20030701; JP2004-139679 20040510; JP2004-139680 20040510
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03B27/42
摘要:
A projection optical system projects an image of a first object onto a second object. A first imaging optical system forms a first intermediate image of the first object, and is a refractive optical system. A second imaging optical system forms a second intermediate image of the first object, and includes two mirrors, one of the two being concave. A third imaging optical system forms an image of the first object onto the second object, and includes a lens. The first, second and third imaging optical systems are arranged along an optical path from the first object in this order. The system satisfies the expression 0.80
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