发明授权
- 专利标题: Radiation treatment plan making system and method
- 专利标题(中): 辐射治疗计划制定系统及方法
-
申请号: US09904889申请日: 2001-07-16
-
公开(公告)号: US07054801B2公开(公告)日: 2006-05-30
- 发明人: Hidenobu Sakamoto , Yuehu Pu
- 申请人: Hidenobu Sakamoto , Yuehu Pu
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2001-014870 20010123
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; G06G7/62 ; A61N5/00 ; G21G5/00
摘要:
A radiation exposure region to be irradiated with particle beams and a peripheral region thereof are respectively divided into pluralities of exposure regions, radiation treatment simulation for applying particle beams according to the shape of each divided exposure region is performed, and a radiation treatment condition is obtained for causing the flatness of the radiation exposure region to be in a desired range, and a dose of particle beams applied to the unit exposure region of the peripheral region to be minimum. Thus, the problem of low efficiency of radiation is solved.
公开/授权文献
- US20020128807A1 Radiation treatment system and method 公开/授权日:2002-09-12