Invention Grant
- Patent Title: Process and apparatus for abatement of by products generated from deposition processes and cleaning of deposition chambers
- Patent Title (中): 用于减少由沉积工艺产生的产品和清洁沉积室的工艺和设备
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Application No.: US09908668Application Date: 2001-07-18
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Publication No.: US07060234B2Publication Date: 2006-06-13
- Inventor: Himanshu Pokharna , Phong Le , Srinivas D. Nemani
- Applicant: Himanshu Pokharna , Phong Le , Srinivas D. Nemani
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials
- Current Assignee: Applied Materials
- Current Assignee Address: US CA Santa Clara
- Agency: Townsend Townsend Crew, LLP
- Main IPC: A62D3/00
- IPC: A62D3/00

Abstract:
Method and apparatus for abating F2 from byproducts generated during cleaning of a processing chamber. F2 abatement is efficiently performed by directly injecting H2 in line with a foreline exiting the processing chamber. A tube which is highly resistant to oxidation and corrosive gases, even at high temperature, is connected in line with the foreline as part of the exhaust line of the processing chamber. A cooling jacket may be provided for cooling the tube, since the reaction between F2 and H2 is exothermic. A pressure monitoring arrangement may also be employed to insure that pressure within a hydrogen line, that feeds the injection of H2 into the tube, does not exceed a predetermined pressure value.
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