Invention Grant
US07060988B2 Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system
有权
在大电流气体簇离子束处理系统中改善光束稳定性的方法和装置
- Patent Title: Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system
- Patent Title (中): 在大电流气体簇离子束处理系统中改善光束稳定性的方法和装置
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Application No.: US11082584Application Date: 2005-03-17
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Publication No.: US07060988B2Publication Date: 2006-06-13
- Inventor: Michael E. Mack , Robert K. Becker , Matthew C. Gwinn
- Applicant: Michael E. Mack , Robert K. Becker , Matthew C. Gwinn
- Applicant Address: US MA Billerica
- Assignee: Epion Corporation
- Current Assignee: Epion Corporation
- Current Assignee Address: US MA Billerica
- Agent Jerry Cohen; John A. Hamilton
- Main IPC: H01J27/00
- IPC: H01J27/00
Abstract:
Apparatus and methods for improving beam stability in high current gas-cluster ion beam systems by reducing the frequency of transients occurring in the vicinity of the ionizer through use of shielding conductors and distinct component electrical biasing to inhibit backward extraction of ions from the ionizer towards the gas-jet generator.
Public/Granted literature
- US20050205801A1 Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system Public/Granted day:2005-09-22
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