发明授权
- 专利标题： Polymers, resist compositions and patterning process
- 专利标题（中）： 聚合物，抗蚀剂组合物和图案化工艺
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申请号： US10968971申请日： 2004-10-21
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公开(公告)号： US07067231B2公开(公告)日： 2006-06-27
- 发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
- 申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
- 申请人地址： JP Tokyo JP Osaka JP Yamaguchi-ken
- 专利权人： Shin-Etsu Chemical Co., Ltd.,Matsushita Electric Industrial Co., Ltd.,Central Glass Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.,Matsushita Electric Industrial Co., Ltd.,Central Glass Co., Ltd.
- 当前专利权人地址： JP Tokyo JP Osaka JP Yamaguchi-ken
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2003-363134 20031023
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30
摘要：
A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance
公开/授权文献
- US20050089797A1 Polymers, resist compositions and patterning process 公开/授权日：2005-04-28
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