Invention Grant
- Patent Title: Atmospheric glow discharge with concurrent coating deposition
- Patent Title (中): 大气辉光放电同时进行涂层沉积
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Application No.: US10883167Application Date: 2004-07-01
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Publication No.: US07067405B2Publication Date: 2006-06-27
- Inventor: Michael G. Mikhael , Angelo Yializis , Richard E. Ellwanger
- Applicant: Michael G. Mikhael , Angelo Yializis , Richard E. Ellwanger
- Applicant Address: US AZ Tucson
- Assignee: Sigma Laboratories of Arizona, Inc.
- Current Assignee: Sigma Laboratories of Arizona, Inc.
- Current Assignee Address: US AZ Tucson
- Agent Antonio R. Durando
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A plasma is produced in a treatment space by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes separated by a dielectric material, a precursor material is mixed with the plasma, and a substrate film or web is coated by vapor deposition of the vaporized substance at atmospheric pressure in the plasma field. The deposited precursor is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being-deposited. Plasma pre-treatment and post-treatment steps are used to enhance the properties of the resulting coated products. Similar results are obtained by atomizing and spraying the liquid precursor in the plasma field.
Public/Granted literature
- US20050020038A1 Atmospheric glow discharge with concurrent coating deposition Public/Granted day:2005-01-27
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