发明授权
US07069155B1 Real time analytical monitor for soft defects on reticle during reticle inspection
有权
光罩检测时光罩上的软缺陷的实时分析监视器
- 专利标题: Real time analytical monitor for soft defects on reticle during reticle inspection
- 专利标题(中): 光罩检测时光罩上的软缺陷的实时分析监视器
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申请号: US10676455申请日: 2003-10-01
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公开(公告)号: US07069155B1公开(公告)日: 2006-06-27
- 发明人: Khoi Phan , Bhanwar Singh , Bharath Rangarajan
- 申请人: Khoi Phan , Bhanwar Singh , Bharath Rangarajan
- 申请人地址: US CA Sunnyvale
- 专利权人: Advanced Micro Devices, Inc.
- 当前专利权人: Advanced Micro Devices, Inc.
- 当前专利权人地址: US CA Sunnyvale
- 代理机构: Amin & Turocy, LLP
- 主分类号: G01B5/28
- IPC分类号: G01B5/28 ; G06K9/00 ; H01L26/00
摘要:
The present invention generally relates to semiconductor processing, and in particular to methods and systems for analyzing photolithographic reticle defects that include detecting soft defects on a reticle and analyzing the material composition of the defects for a particular chemical signature. Specifically, the present invention scans and images a soft defect via an optical inspection scan of a reticle, mills the defect using a Focused Ion Beam, and analyzes the defect for signatures using Electron Spectroscopy for Chemical Analysis and/or Fourier Transform Infrared Spectroscopy. The present invention thus provides for real-time analysis of the chemical composition of a soft defect on a reticle without the need for a defect identification navigation system. According to an aspect of the present invention, reticle defects can be monitored without removal of a pellicle, thus facilitating increased throughput and decreased cost in reticle repair and/or cleaning. According to another aspect of the invention, signatures occurring in trace amounts can be removed via employing a Focused Ion Beam in a non-reactive gas environment.