发明授权
- 专利标题: Method of manufacturing monolithic inkjet printhead
- 专利标题(中): 制造单片喷墨打印头的方法
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申请号: US11028665申请日: 2005-01-05
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公开(公告)号: US07070912B2公开(公告)日: 2006-07-04
- 发明人: Byung-ha Park , Myong-jong Kwon , Young-ung Ha , Sung-joon Park
- 申请人: Byung-ha Park , Myong-jong Kwon , Young-ung Ha , Sung-joon Park
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Roylance, Abrams, Berdo & Goodman, L.L.P.
- 优先权: KR10-2004-0004429 20040120
- 主分类号: B41J2/16
- IPC分类号: B41J2/16
摘要:
A method of manufacturing a monolithic inkjet printhead wherein the uniformity of the ink flow path is maintained by ensuring that the flow path forming layer and the nozzle layer are completely adhered to each other. The method includes forming a heater and electrode on a substrate, coating a negative photoresist on the substrate, and patterning the photoresist using a photolithography process to form an flow path forming layer that defines an ink flow path. The method further comprises steps for then forming a sacrificial layer so as to cover the flow path forming layer and then flattening upper surfaces of the flow path forming layer and the sacrificial layer using a chemical mechanical polishing (CMP) process such that when a nozzle layer is then formed, the flow path forming layer and the nozzle layer are completely adhered to each other.
公开/授权文献
- US20050155949A1 Method of manufacturing monolithic inkjet printhead 公开/授权日:2005-07-21