- 专利标题: Semiconductor integrated circuit device having single-element type non-volatile memory elements
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申请号: US11220723申请日: 2005-09-08
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公开(公告)号: US07071050B2公开(公告)日: 2006-07-04
- 发明人: Kazuhiro Komori , Toshiaki Nishimoto , Satoshi Meguro , Hitoshi Kume , Yoshiaki Kamigaki
- 申请人: Kazuhiro Komori , Toshiaki Nishimoto , Satoshi Meguro , Hitoshi Kume , Yoshiaki Kamigaki
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout and Kraus, LLP.
- 优先权: JP63-284587 19881109
- 主分类号: H01L21/8238
- IPC分类号: H01L21/8238
摘要:
A semiconductor memory device having nonvolatile memory cells each formed of a MISFET having both a floating gate and a control gate and first and second semiconductor regions serving as the source and drain regions, respectively. In accordance with the method of manufacture thereof, an impurity, for example, arsenic, is introduced to form both the first and second semiconductor regions but with the second semiconductor region having a lower dose thereof so that the first semiconductor region formed attains a junction depth greater than that of the second semiconductor region, and both the first and second semiconductor regions have portions thereof extending under the floating gate electrode. The device and method therefor further feature the formation of MISFETs of peripheral circuits.
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