Invention Grant
- Patent Title: Electrostatic discharge protection device
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Application No.: US10395328Application Date: 2003-03-24
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Publication No.: US07075154B2Publication Date: 2006-07-11
- Inventor: Shi-Tron Lin , Wei-Fan Chen
- Applicant: Shi-Tron Lin , Wei-Fan Chen
- Applicant Address: TW Hsinchu
- Assignee: Winbond Electronics Corp.
- Current Assignee: Winbond Electronics Corp.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Bitch, LLP
- Priority: TW91106186A 20020328
- Main IPC: H01L23/62
- IPC: H01L23/62

Abstract:
An electrostatic discharge protection device formed on a substrate. The electrostatic discharge protection device includes a first isolation region formed over the substrate, an active region formed over the substrate and enclosed by the first isolation region, a second isolation region formed on the substrate and substantially surrounded by the active region, a first gate element formed in the active region, the first gate element having a first end extending over the first isolation region and a second end extending over the second isolation region, a drain region formed in the active region at a first side of the first gate element, a source region formed in the active region at a second side of the first gate element, a drain contact for electrically coupling the drain region to a first node, and a source contact for electrically coupling the source region to a second node.
Public/Granted literature
- US20030184933A1 Electrostatic discharge protection device Public/Granted day:2003-10-02
Information query
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