In an electron beam apparatus including an electron source and an electron beam irradiation member, a potential specifying plate including openings through which an electron transmits is provided between the electron source and the electron beam irradiation member. A spacer is located between the electron beam irradiation member and the potential specifying plate. In the case where a distance between a region between one opening of the potential specifying plate near the spacer and the spacer and the electron beam irradiation member is D1 and a distance between a region between that opening and another opening not near the spacer and the electron beam irradiation member is given by D2, if D1