发明授权
- 专利标题： Device manufacturing method and a lithographic apparatus
- 专利标题（中）： 器件制造方法和光刻设备
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申请号： US10976178申请日： 2004-10-29
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公开(公告)号： US07075617B2公开(公告)日： 2006-07-11
- 发明人: Aleksey Yurievich Kolesnychenko , Ralph Kurt , Carolus Ida Maria Antonius Spee
- 申请人： Aleksey Yurievich Kolesnychenko , Ralph Kurt , Carolus Ida Maria Antonius Spee
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP03078421 20031030
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A device manufacturing method is disclosed. The method includes patterning a beam of radiation with a patterning device, projecting the patterned beam of radiation onto a target portion of a substrate, supplying a chemical reagent to a chamber that holds the patterning device and/or the substrate, and removing water from the chamber with use of the chemical reagent.
公开/授权文献
- US20050148211A1 Device manufacturing method and a lithographic apparatus 公开/授权日：2005-07-07
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