Invention Grant
- Patent Title: Nitride semiconductor LED improved in lighting efficiency and fabrication method thereof
-
Application No.: US10875321Application Date: 2004-06-25
-
Publication No.: US07078256B2Publication Date: 2006-07-18
- Inventor: Yung Ho Ryu , Kee Jeong Yang , Bang Won Oh , Jin Sub Park , Young Hoon Kim
- Applicant: Yung Ho Ryu , Kee Jeong Yang , Bang Won Oh , Jin Sub Park , Young Hoon Kim
- Applicant Address: KR Kyungki-Do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Kyungki-Do
- Agency: Lowe Hauptman & Berner, LLP.
- Priority: KR10-2004-0018597 20040318
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A nitride semiconductor LED improved in lighting efficiency and a fabrication method thereof, in which an n-doped semiconductor layer is formed on a substrate. An active layer is formed on the n-doped semiconductor layer to expose at least a partial area of the n-doped semiconductor layer. A p-doped semiconductor layer is formed on the active layer. A p+-doped semiconductor layer is formed on the p-doped semiconductor layer. An n+-doped semiconductor layer is formed in at least a partial upper region of the p+-doped semiconductor layer via n-dopant ion implantation. The n+-doped semiconductor layer cooperates with an underlying partial region of the p+-doped semiconductor layer to realize a reverse bias tunneling junction. Also, an upper n-doped semiconductor layer is formed on the n+-doped semiconductor layer to realize lateral current spreading. The invention can improve lighting efficiency by using the reverse bias tunneling junction and/or the lateral current spreading.
Public/Granted literature
- US20050208686A1 Nitride semiconductor LED improved in lighting efficiency and fabrication method thereof Public/Granted day:2005-09-22
Information query
IPC分类: