Invention Grant
- Patent Title: Method for fabricating optical interference display cell
- Patent Title (中): 光学干涉显示单元的制造方法
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Application No.: US10796997Application Date: 2004-03-11
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Publication No.: US07078293B2Publication Date: 2006-07-18
- Inventor: Wen-Jian Lin , Hsiung-Kuang Tsai
- Applicant: Wen-Jian Lin , Hsiung-Kuang Tsai
- Applicant Address: TW Hsinchu
- Assignee: Prime View International Co., Ltd.
- Current Assignee: Prime View International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Baker & Hostetler LLP
- Priority: TW92114188A 20030526
- Main IPC: H01L21/302
- IPC: H01L21/302
Abstract:
A method for fabricating an optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.
Public/Granted literature
- US20050003667A1 Method for fabricating optical interference display cell Public/Granted day:2005-01-06
Information query
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