发明授权
- 专利标题: Beam source and beam processing apparatus
- 专利标题(中): 光源和光束处理装置
-
申请号: US10797596申请日: 2004-03-11
-
公开(公告)号: US07078862B2公开(公告)日: 2006-07-18
- 发明人: Akira Fukuda , Akio Shibata , Hirokuni Hiyama , Katsunori Ichiki , Kazuo Yamauchi , Seiji Samukawa
- 申请人: Akira Fukuda , Akio Shibata , Hirokuni Hiyama , Katsunori Ichiki , Kazuo Yamauchi , Seiji Samukawa
- 申请人地址: JP Tokyo JP Sendai
- 专利权人: Ebara Corporation,Tohoku University
- 当前专利权人: Ebara Corporation,Tohoku University
- 当前专利权人地址: JP Tokyo JP Sendai
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP.
- 优先权: JP2003-071071 20030314
- 主分类号: H05B31/26
- IPC分类号: H05B31/26 ; C23C16/00
摘要:
A beam source has a plasma generating chamber, an antenna for generating plasma in the plasma generating chamber, a first electrode disposed in the plasma generating chamber, and a second electrode disposed in the plasma generating chamber. Both of the antenna and the second electrode face the first electrode. The beam source also includes a power supply for applying a voltage between the first electrode and the second electrode to extract particles from the plasma generated by the antenna. The beam source applies various kinds of beams having a large diameter, such as a positive ion beam, a negative ion beam, and a neutral particle beam, uniformly to a workpiece.
公开/授权文献
- US20040221815A1 Beam source and beam processing apparatus 公开/授权日:2004-11-11