Invention Grant
- Patent Title: Micro-casted silicon carbide nano-imprinting stamp
- Patent Title (中): 微型碳化硅纳米压印
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Application No.: US10794928Application Date: 2004-03-05
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Publication No.: US07080596B2Publication Date: 2006-07-25
- Inventor: Heon Lee , Gun-Young Jung
- Applicant: Heon Lee , Gun-Young Jung
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, LP.
- Current Assignee: Hewlett-Packard Development Company, LP.
- Current Assignee Address: US TX Houston
- Main IPC: B82B1/00
- IPC: B82B1/00 ; B29C33/38

Abstract:
A micro-casted silicon carbide nano-imprinting stamp and method of making a micro-casted silicon carbide nano-imprinting stamp are disclosed. A micro-casting technique is used to form a foundation layer and a plurality of nano-sized features connected with the foundation layer. The foundation layer and the nano-sized features are unitary whole that is made entirely from a material comprising silicon carbide (SiC) which is harder than silicon (Si) alone. As a result, the micro-casted silicon carbide nano-imprinting stamp has a longer service lifetime because it can endure several imprinting cycles without wearing out or breaking. The longer service lifetime makes the micro-casted silicon carbide nano-imprinting stamp economically feasible to manufacture as the manufacturing cost can be recouped over the service lifetime.
Public/Granted literature
- US20040169003A1 Micro-casted silicon carbide nano-imprinting stamp Public/Granted day:2004-09-02
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