- 专利标题: Mask, substrate with light reflection film, manufacturing method for light reflection film, manufacturing method for electro-optical device, and electro-optical device, and electronic apparatus
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申请号: US11224708申请日: 2005-09-12
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公开(公告)号: US07085036B2公开(公告)日: 2006-08-01
- 发明人: Toshihiro Otake , Mutsumi Matsuo , Tadashi Tsuyuki
- 申请人: Toshihiro Otake , Mutsumi Matsuo , Tadashi Tsuyuki
- 申请人地址: JP
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: JP2001-186694 20010620; JP2002-108526 20020410
- 主分类号: G02F1/29
- IPC分类号: G02F1/29 ; G02F1/1335
摘要:
A substrate is provided with a light reflection film in which the heights of a plurality of convex portions or the depths of concave portions formed on a base material are specified to be substantially the same. The two-dimensional shapes of the plurality of convex portions or concave portions are specified to be the two-dimensional shapes of independent circles and polygons, or of either of them. In addition, the plurality of convex portions or concave portions are arranged in the direction of the plane on a random basis. The substrate is formed using a mask in which light transmission portions or light non-transmission portions are formed in units of dots, the number thereof being smaller than the number of dot regions. The dots are arranged irregularly in each of the units, and a plurality of units are included.
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