Invention Grant
- Patent Title: System for detecting anomalies and/or features of a surface
- Patent Title (中): 用于检测表面的异常和/或特征的系统
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Application No.: US10360512Application Date: 2003-02-06
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Publication No.: US07088443B2Publication Date: 2006-08-08
- Inventor: Mehdi Vaez-Iravani , Guoheng Zhao , Stanley E. Stokowski
- Applicant: Mehdi Vaez-Iravani , Guoheng Zhao , Stanley E. Stokowski
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corporation
- Current Assignee: KLA-Tencor Technologies Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Parsons Hsue & deRuntz LLP
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam. For inspecting surface with a pattern thereon, the light from the surface is first passed through a spatial filter before it is imaged onto the charge-coupled devices. The spatial filter includes stripes of scattering regions that shift in synchronism with relative motion between the beam and the surface to block Fourier components from the pattern. The spatial filter may be replaced by reflective strips that selectively reflects scattered radiation to the detector, where the reflective strips also shifts in synchronism with the relative motion.
Public/Granted literature
- US20060038984A9 System for detecting anomalies and/or features of a surface Public/Granted day:2006-02-23
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