发明授权
- 专利标题: Microscope with wavelength compensation
- 专利标题(中): 具有波长补偿的显微镜
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申请号: US10771729申请日: 2004-02-04
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公开(公告)号: US07095556B2公开(公告)日: 2006-08-22
- 发明人: Yoshinori Iketaki , Takeshi Watanabe , Masaaki Fujii , Yasunori Igasaki , Toshio Suzuki
- 申请人: Yoshinori Iketaki , Takeshi Watanabe , Masaaki Fujii , Yasunori Igasaki , Toshio Suzuki
- 申请人地址: JP Kawaguchi JP Tokyo JP Hamamatsu JP Chiba
- 专利权人: Japan Science and Technology Agency,Olympus Corporation,Hamamatsu Photonics KK,Nippon Roper KK
- 当前专利权人: Japan Science and Technology Agency,Olympus Corporation,Hamamatsu Photonics KK,Nippon Roper KK
- 当前专利权人地址: JP Kawaguchi JP Tokyo JP Hamamatsu JP Chiba
- 代理机构: Frishauf, Holtz, Goodman & Chick, PC
- 优先权: JP2003-026796 20030204
- 主分类号: G02B21/06
- IPC分类号: G02B21/06 ; G01J3/30
摘要:
A microscope capable of being shaped into a beam with complete hollow shape by removing the disorder of the wavefront to the erase light, particularly, and capable of improving the spatial resolution by inducing a super-resolution near the limit, is provided. In the microscope, wherein a first light to excite a molecule from a ground-state to first electron excited state or a second light to excite the molecule from the first electron excited state to the second electron excited state with higher energy level, for a sample 56 including the molecule with three electronic states including at least a ground-state, are spatial phase-modulated into the prescribed beam shape, and parts of these first light and the second light are overlapped and focused to detect luminescence from the sample 56, a wavefront compensation means 61 is provided in the optical path of the first light and/or in the optical path of the second light, and the wavefront aberration caused in the first light and/or in the second light, is removed by the wavefront compensation means 61.
公开/授权文献
- US20040227101A1 Microscope 公开/授权日:2004-11-18