发明授权
- 专利标题： Method of forming a film of predetermined pattern on a surface as well as device manufactured by employing the same, and method of manufacturing device
- 专利标题（中）： 在表面上形成预定图案的膜的方法以及使用该膜的装置以及制造装置的方法
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申请号： US10367854申请日： 2003-02-19
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公开(公告)号： US07098121B2公开(公告)日： 2006-08-29
- 发明人: Yoshiaki Mori , Takuya Miyakawa , Mitsuru Sato , Shintaro Asuke , Kenichi Takagi
- 申请人： Yoshiaki Mori , Takuya Miyakawa , Mitsuru Sato , Shintaro Asuke , Kenichi Takagi
- 申请人地址： JP Tokyo
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2002-070393 20020314
- 主分类号： H01L21/22
- IPC分类号： H01L21/22
摘要：
An object is to provide a mask formation method, which can curtail a manufacturing cost.A method of forming a film of predetermined pattern on the front surface of a member to-be-processed is so constructed as to carry out the step (S178) of improving the adherence of a pattern material solution to the member to-be-processed, the step (S180) of filling up a pattern forming recess provided in a mask on the surface of the member to-be-processed with a pattern material solution, the step (S186) of improving the film quality of the pattern film to-be-formed by processing the pattern material solution, the step (S188) of removing the pattern material solution having adhered on the mask, the step (S190) of drying the pattern material solution, and the step (S196) of subjecting the pattern film to annealing processing.
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