发明授权
- 专利标题: Exposure device for exposing a photosensitive material in accordance with image data
- 专利标题(中): 用于根据图像数据曝光感光材料的曝光装置
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申请号: US10098755申请日: 2002-03-21
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公开(公告)号: US07098993B2公开(公告)日: 2006-08-29
- 发明人: Takeshi Fujii , Yoji Okazaki , Mitsuru Sawano , Kazuhiko Nagano
- 申请人: Takeshi Fujii , Yoji Okazaki , Mitsuru Sawano , Kazuhiko Nagano
- 申请人地址: JP Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2001-083739 20010322; JP2001-274359 20010910
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03B27/72 ; G06F3/12
摘要:
An inexpensive and highly productive exposure device for directly scanning and exposing a photosensitive material sensitive to at least a UV region, based on digital data. As a motor controller moves an exposure head at a fixed speed in Y direction, image data is read one line of image data, each GLV element of a light modulator array is switched on/off by the read image data, and laser light from a high power light source of the exposure head is switched on/off. A UV-sensitive object to be exposed is exposed in X direction in a number of pixel units that substantially corresponds to the number of the GLV elements. The image data is scanned and exposed by one line in Y direction (main-scan). The motor controller moves a flat stage by one step in X direction (sub-scan). The object to be exposed is imagewise-exposed by repeating such scans.
公开/授权文献
- US20020180944A1 Exposure device 公开/授权日:2002-12-05
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