发明授权
- 专利标题: Process for producing a fluorine atom-containing sulfonyl fluoride compound
- 专利标题(中): 含氟原子的磺酰氟化合物的制造方法
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申请号: US10808274申请日: 2004-03-25
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公开(公告)号: US07105697B2公开(公告)日: 2006-09-12
- 发明人: Masahiro Ito , Kunio Watanabe , Takashi Okazoe , Isamu Kaneko , Daisuke Shirakawa
- 申请人: Masahiro Ito , Kunio Watanabe , Takashi Okazoe , Isamu Kaneko , Daisuke Shirakawa
- 申请人地址: JP Tokyo
- 专利权人: Asahi Glass Company, Limited
- 当前专利权人: Asahi Glass Company, Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2000-361450 20001128
- 主分类号: C07C309/00
- IPC分类号: C07C309/00
摘要:
The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSO2RA-E1 (1) with RB-E2 (2) to form XSO2RA-E-RB (3), then reacting (3) with fluorine in a liquid phase to form FSO2RAF-EF-RBF (4), and further, decomposing the compound to obtain FSO2RAF-EF1 (5), wherein RA is a bivalent organic group, E1 is a monovalent reactive group, RB is a monovalent organic group, E2 is a monovalent reactive group which is reactive with E1, E is a bivalent connecting group formed by the reaction of E1 with E2, RAF is a bivalent organic group formed by the fluorination of RA, etc., RBF is the same group as RB, etc., EF is a bivalent connecting group formed by the fluorination of E, etc., EF1 is a monovalent group formed by the decomposition of EF, and X is a halogen atom.
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