发明授权
- 专利标题： Method of chemical mechanical polishing using abrasive particles of alkaline earth metal salts
- 专利标题（中）： 使用碱土金属盐磨料颗粒进行化学机械抛光的方法
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申请号： US10870423申请日： 2004-06-18
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公开(公告)号： US07108586B2公开(公告)日： 2006-09-19
- 发明人: Karl Koehler , Ferdinand Hardinghaus , Jai-Won Park
- 申请人： Karl Koehler , Ferdinand Hardinghaus , Jai-Won Park
- 申请人地址： DE Hannover
- 专利权人： Solvay Barium Strontium GmbH
- 当前专利权人： Solvay Barium Strontium GmbH
- 当前专利权人地址： DE Hannover
- 代理机构： Crowell & Moring LLP
- 优先权： DE10163570 20011221
- 主分类号： B24B1/00
- IPC分类号： B24B1/00
摘要：
Particles of strontium carbonate, barium carbonate, strontium sulfate and/or barium sulfate having a sufficient degree of fineness, especially when produced synthetically, are suitable as abrasive agents in chemical mechanical polishing (CMP polishing) of components, e.g., microelectronic components such as silicon wafers. The alkaline earth metal salt compounds are used as slurries in water and/or organic liquids and optionally may contain a dispersing agent, and preferably have a pH value of at least 8.
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