发明授权
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
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申请号: US10831370申请日: 2004-04-26
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公开(公告)号: US07110081B2公开(公告)日: 2006-09-19
- 发明人: Christian Alexander Hoogendam , Sjoerd Nicolaas Lambertus Donders , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Alexander Straaijer , Bob Streefkerk
- 申请人: Christian Alexander Hoogendam , Sjoerd Nicolaas Lambertus Donders , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Alexander Straaijer , Bob Streefkerk
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman, LLP
- 优先权: EP02257822 20021112; EP03253636 20030609; EP03254059 20030626
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/52
摘要:
In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.
公开/授权文献
- US20050036121A1 Lithographic apparatus and device manufacturing method 公开/授权日:2005-02-17