发明授权
- 专利标题： Using a partial metal level mask for early test results
- 专利标题（中）： 使用部分金属水平面罩进行早期测试
-
申请号： US10605169申请日： 2003-09-12
-
公开(公告)号： US07111257B2公开(公告)日： 2006-09-19
- 发明人: Norman W. Robson , Teresa J. Wu
- 申请人： Norman W. Robson , Teresa J. Wu
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理商 Eric Petraske
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A method of using special designed wiring level mask(s) to determine product transistor and circuit performance in a chip during the early portion of the product evaluation cycle saves weeks of time that would have been taken by the passage of the wafer through the fab. The method also saves cost during production by identifying wafers for rework at an early stage.
公开/授权文献
- US20050060681A1 USING A PARTIAL METAL LEVEL MASK FOR EARLY TEST RESULTS 公开/授权日：2005-03-17
信息查询
