Invention Grant
- Patent Title: Method for etching
- Patent Title (中): 蚀刻方法
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Application No.: US10455744Application Date: 2003-06-06
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Publication No.: US07115212B2Publication Date: 2006-10-03
- Inventor: Douglas McLean , Bernard Feldman
- Applicant: Douglas McLean , Bernard Feldman
- Applicant Address: US CA Watsonville
- Assignee: Feldman Technology Corporation
- Current Assignee: Feldman Technology Corporation
- Current Assignee Address: US CA Watsonville
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- Main IPC: C23F1/16
- IPC: C23F1/16
Abstract:
A method of etching a metal oxide film includes depositing a metal (M) on the metal oxide film and contacting the metal oxide film and the metal (M) with an etch liquid comprising an acid (A) and a metal dissolution agent (X). The method can avoid patchwise etch.
Public/Granted literature
- US20040045930A1 Method for etching Public/Granted day:2004-03-11
Information query
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