发明授权
- 专利标题： Probe for scanning probe lithography and making method thereof
- 专利标题（中）： 扫描探针光刻的探头及其制作方法
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申请号： US09616076申请日： 2000-07-13
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公开(公告)号： US07115863B1公开(公告)日： 2006-10-03
- 发明人: Masayoshi Ishibashi , Tomihiro Hashizume , Hiroshi Kajiyama
- 申请人： Masayoshi Ishibashi , Tomihiro Hashizume , Hiroshi Kajiyama
- 申请人地址： JP Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Mattingly, Stanger, Malur & Brundidge, P.C.
- 优先权： JP11-241330 19990827
- 主分类号： H01J37/00
- IPC分类号： H01J37/00
摘要：
A probe of scanning probe lithography which provides a long time of useful life. The probe has a tip part comprising a conductor and an insulator, the insulator is formed to cover the conductor, and the conductor is formed to provide a substantially uniform cross-sectional configuration with respect to a surface to be patterned through scanning.
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