发明授权
US07116125B2 Semiconductor test device using leakage current and compensation system of leakage current 失效
半导体测试装置采用漏电流补偿系统的漏电流

  • 专利标题: Semiconductor test device using leakage current and compensation system of leakage current
  • 专利标题(中): 半导体测试装置采用漏电流补偿系统的漏电流
  • 申请号: US10898219
    申请日: 2004-07-26
  • 公开(公告)号: US07116125B2
    公开(公告)日: 2006-10-03
  • 发明人: Kwang-Il Kim
  • 申请人: Kwang-Il Kim
  • 申请人地址: KR Gyeonggi-do
  • 专利权人: Samsung Electronics Co., Ltd.
  • 当前专利权人: Samsung Electronics Co., Ltd.
  • 当前专利权人地址: KR Gyeonggi-do
  • 代理机构: Harness, Dickey & Pierce, P.L.C.
  • 优先权: KR10-2003-0053860 20030804; KR10-2003-0053861 20030804; KR10-2004-0031461 20040504
  • 主分类号: G01R31/02
  • IPC分类号: G01R31/02
Semiconductor test device using leakage current and compensation system of leakage current
摘要:
The present invention relates to a semiconductor test device which may use a leakage current and/or a compensation system of leakage current. The semiconductor test device, according to exemplary embodiments of the present invention, may include MOS transistors which may be fabricated in processes similar to those of the semiconductor device. The semiconductor test device may sense the leakage currents which may flow in the MOS transistors, may test whether the semiconductor device may be fabricated normally or abnormally, and may generate at least a normal or abnormal signal as a result. The leakage current compensation device may compensate for the leakage current which may flow in the semiconductor device in response to the normal or abnormal signal of the semiconductor test device. According to exemplary embodiments of the present invention, abnormally-fabricated MOS transistors may be tested and malfunctions of the semiconductor device may be reduced by the leakage current compensation device.
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