发明授权
- 专利标题： Lithographic apparatus, device manufacturing method, and angular encoder
- 专利标题（中）： 光刻设备，器件制造方法和角度编码器
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申请号： US10833340申请日： 2004-04-28
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公开(公告)号： US07119886B2公开(公告)日： 2006-10-10
- 发明人: Martinus Hendrikus Antonius Leenders , Hendricus Johannes Maria Meijer , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Theo Anjes Maria Ruijl
- 申请人： Martinus Hendrikus Antonius Leenders , Hendricus Johannes Maria Meijer , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Theo Anjes Maria Ruijl
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 优先权： EP03252746 20030429
- 主分类号： G01C3/08
- IPC分类号： G01C3/08 ; G01B11/14 ; G03B27/54
摘要：
In a lithographic projection apparatus, a measuring system configured to measure the position of the projection system relative to a reference frame includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table position. An angular encoder which sends light from a target down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system about its optical axis.