发明授权
- 专利标题: Display device, process of fabricating same, and apparatus for fabricating same
- 专利标题(中): 显示装置及其制造方法及其制造装置
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申请号: US10628421申请日: 2003-07-29
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公开(公告)号: US07129124B2公开(公告)日: 2006-10-31
- 发明人: Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
- 申请人: Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
- 申请人地址: JP Hayano Mobara
- 专利权人: Hitachi Displays, Ltd.
- 当前专利权人: Hitachi Displays, Ltd.
- 当前专利权人地址: JP Hayano Mobara
- 代理机构: Antonelli, Terry, Stout and Kraus, LLP.
- 优先权: JP2002-256533 20020902; JP2003-062938 20030310
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01I21/26
摘要:
The active layer (active region) of the thin-film transistor making up the driver circuit is obtained by reformation implemented by scanning the continuous-wave laser light, condensed into a linear form or a rectangle form extremely longer in the longitudinal direction than in the transverse direction, along a given direction crossing the longitudinal direction. This is made up of a poly silicon film containing crystal grains having no grain boundaries crossing the direction of current flow, that is, a band-like polycrystalline silicon film. As a result, it is possible to implement a display device having stable and high quality active elements outside the display region on the insulating substrate.