- 专利标题: Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
-
申请号: US10766041申请日: 2004-01-29
-
公开(公告)号: US07129485B2公开(公告)日: 2006-10-31
- 发明人: Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
- 申请人: Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
- 申请人地址: JP Tokyo
- 专利权人: Ebara Corporation
- 当前专利权人: Ebara Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP.
- 优先权: JP2000-378040 20001212; JP2000-388385 20001221; JP2001-3666 20010111; JP2001-5128 20010112; JP2001-17801 20010126; JP2001-21183 20010130; JP2001-23804 20010131; JP2001-26580 20010202; JP2001-31901 20010208; JP2001-31906 20010208; JP2001-33599 20010209; JP2001-44964 20010221; JP2001-52095 20010227; JP2001-73380 20010315; JP2001-131238 20010427; JP2001-158571 20010528
- 主分类号: G01N23/00
- IPC分类号: G01N23/00
摘要:
The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
公开/授权文献
信息查询