Invention Grant
- Patent Title: Reticle-masking objective with aspherical lenses
- Patent Title (中): 带非球面透镜的掩模掩模物镜
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Application No.: US10735172Application Date: 2003-12-12
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Publication No.: US07130129B2Publication Date: 2006-10-31
- Inventor: Jurgen Grunwald, deceased
- Applicant: Jorg Schultz , Johannes Wangler , Karl-Heinz Schuster , Alexander Sohmer , Alexander Epple , Christa Müller, legal representative , Janosch Müller, legal representative
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Darby & Darby
- Priority: DE19653983 19961212; DE10108677 20010223
- Main IPC: G02B3/02
- IPC: G02B3/02 ; G02B9/00
Abstract:
A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.
Public/Granted literature
- US20040207928A1 Reticle-masking objective with aspherical lenses Public/Granted day:2004-10-21
Information query
IPC分类:
| G | 物理 |
| G02 | 光学 |
| G02B | 光学元件、系统或仪器 |
| G02B3/00 | 简单或复合透镜 |
| G02B3/02 | .具有非球面的（G02B3/10优先） |
