发明授权
US07132222B2 Magnetic etching process, especially for magnetic or magnetooptic recording
有权
磁性蚀刻工艺，特别适用于磁性或磁光记录
- 专利标题： Magnetic etching process, especially for magnetic or magnetooptic recording
- 专利标题（中）： 磁性蚀刻工艺，特别适用于磁性或磁光记录
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申请号： US10825454申请日： 2004-04-14
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公开(公告)号： US07132222B2公开(公告)日： 2006-11-07
- 发明人: Claude Chappert , Harry Bernas , Jacques Ferre
- 申请人： Claude Chappert , Harry Bernas , Jacques Ferre
- 申请人地址： FR Paris Cedex 16
- 专利权人： Centre National de la Recherche Scientifique (CNRS)
- 当前专利权人： Centre National de la Recherche Scientifique (CNRS)
- 当前专利权人地址： FR Paris Cedex 16
- 代理机构： Blakely Sokoloff Taylor & Zafman LLP
- 优先权： FR9800199 19980112
- 主分类号： G03C5/00
- IPC分类号： G03C5/00 ; G11B11/10 ; H01F41/14
摘要：
Process for writing on a material, in which said material is irradiated by means of a beam of light ions, such as for example He+ ions, said beam of light ions having an energy of the order of or less than a hundred keV, wherein this material comprises a plurality of superposed thin-layers, at least one of said thin layers being magnetic and in that one or more regions having sizes of the order of 1 micrometer or less are irradiated, the irradiation dose being controlled so as to be a few 1016 ions/cm2 or less, the irradiation modifying the composition of atomic planes in the material at one or more interfaces between two layers of the latter.