发明授权
- 专利标题: One-step synthesis of CF3-1
- 专利标题(中): 一步合成CF3-1
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申请号: US11181311申请日: 2005-07-14
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公开(公告)号: US07132578B1公开(公告)日: 2006-11-07
- 发明人: Sudip Mukhopadhyay , Hsueh Sung Tung
- 申请人: Sudip Mukhopadhyay , Hsueh Sung Tung
- 申请人地址: US NJ Morristown
- 专利权人: Honeywell International Inc.
- 当前专利权人: Honeywell International Inc.
- 当前专利权人地址: US NJ Morristown
- 代理商 Colleen D. Szuch
- 主分类号: C07C17/00
- IPC分类号: C07C17/00
摘要:
A process for the preparation of trifluoromethyl iodide is provided. The process includes the step of contacting in a reactor a compound represented by the formula: CF3—W and a compound represented by the formula: IFn wherein W can be H, Br, Cl, COOH, COCl, COOCH3, COOC2H5, COCH3, COPh, CF3, Si(CH3)3, SPh, SCH3, SSCF3, SSPh, SSCH3, or SO2Cl, wherein n is 1, 3, 5, or 7, and wherein the step of contacting is carried out, at a temperature, pressure and for a length of time sufficient to produce trifluoromethyl iodide. The contacting step can be carried out in the presence or absence of a catalyst and the contacting step can be carried out in the presence or absence of air.
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