发明授权
- 专利标题: Frictional resistance generation mechanism
- 专利标题(中): 摩擦阻力发生机制
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申请号: US10853784申请日: 2004-05-26
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公开(公告)号: US07134963B2公开(公告)日: 2006-11-14
- 发明人: Hiroyoshi Tsuruta , Hiroshi Uehara
- 申请人: Hiroyoshi Tsuruta , Hiroshi Uehara
- 申请人地址: JP Osaka
- 专利权人: Exedy Corporation
- 当前专利权人: Exedy Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: Global IP Counselors, LLP
- 优先权: JP2003-162895 20030606; JP2003-291030 20030811; JP2003-434460 20031226; JP2004-017470 20040126
- 主分类号: F16F15/129
- IPC分类号: F16F15/129
摘要:
A friction resistance generation mechanism is disposed between two relatively rotatable members of a rotating mechanism. The mechanism includes an input side disk-like plate 32, output side disk-like plates 30 and 31, first friction shims 61A, and second friction shims 61B. The first friction shims 61A are frictionally engaged with the plates 30 and 31, and engaged in a manner that allows torque to be transmitted by way of a first rotational direction gap 79A to the plate 32. The second friction shims 61B are frictionally engaged with the plates 30 and 31, and engaged in a manner that allows torque to be transmitted to the plate 32 by way of a second rotational direction gap 79B with a different size than the first rotational direction gap 79A.
公开/授权文献
- US20040248655A1 Frictional resistance generation mechanism 公开/授权日:2004-12-09
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