发明授权
US07141275B2 Imprinting lithography using the liquid/solid transition of metals and their alloys
失效
使用金属及其合金的液/固转变进行压印光刻
- 专利标题： Imprinting lithography using the liquid/solid transition of metals and their alloys
- 专利标题（中）： 使用金属及其合金的液/固转变进行压印光刻
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申请号： US10870664申请日： 2004-06-16
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公开(公告)号： US07141275B2公开(公告)日： 2006-11-28
- 发明人: Yong Chen
- 申请人： Yong Chen
- 申请人地址： US TX Houston
- 专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人地址： US TX Houston
- 主分类号： H01L1/04
- IPC分类号： H01L1/04
摘要：
A method is provided for imprinting a pattern having nanoscale features from a mold into the patternable layer on a substrate. The method comprises: providing the mold; forming the patternable layer on the substrate; and imprinting the mold into the patternable layer, wherein the patternable layer comprises a metal or alloy having a transition temperature from its solid form to its liquid form that is within a range of at least 10° above room temperature.
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