Invention Grant
US07151855B2 Pattern measurement method, manufacturing method of semiconductor device, pattern measurement apparatus, and program 有权
图案测量方法,半导体器件的制造方法,图案测量装置和程序

Pattern measurement method, manufacturing method of semiconductor device, pattern measurement apparatus, and program
Abstract:
A pattern measurement method includes acquiring graphic data of a plurality of patterns including image data; processing the graphic data to detect a coordinate of an edge point of the pattern; combining the edge points between the patterns to make a pair of edge points and calculating a distance between the edge points constituting each pair of edge points and an angle between a straight line which connects the edge point to the other edge point and an arbitrary axial line with respect to each pair of edge points to prepare a distance angle distribution map which is a distribution map of the calculated distance and angle of the pair of edge points; and evaluating at least one of a relation of shape between the patterns, a relation of size between the patterns, and a relative location between the patterns on the basis of the prepared distance angle distribution map.
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