- 专利标题： Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby
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申请号： US10084656申请日： 2002-02-28
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公开(公告)号： US07153612B2公开(公告)日： 2006-12-26
- 发明人: Gart-Jan Heerens , Erik Leonardus Ham , Bastiaan Lambertus Wilhemus Marinus Van De Ven
- 申请人： Gart-Jan Heerens , Erik Leonardus Ham , Bastiaan Lambertus Wilhemus Marinus Van De Ven
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP01301864 20010301
- 主分类号： G01F9/00
- IPC分类号： G01F9/00 ; G03B27/58
摘要：
A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.